Description: JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) ...
An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...
Dry etching methods are all anisotropic processes; that is, they direct copper removal in a single direction and avoid the risk of undercutting. Wet methods, all of which rely on chemical ...
Description: JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) ...
(f) Three-dimensional view of the groove after chemical etching, captured by laser scanning ... few defects and high precision. However, relying solely on single-spot laser direct writing, the ...
The process modules provide high precision, high throughput, and outstanding uniformity with clean smooth ... such as electrical characteristics, refractive index, stress, and wet chemical etch rate.