Description: JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) ...
Description: JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) ...
An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...
Dry etching methods are all anisotropic processes; that is, they direct copper removal in a single direction and avoid the risk of undercutting. Wet methods, all of which rely on chemical ...
Chemical etching allows for high precision and accuracy in creating intricate patterns, fine details, and complex geometries. It can achieve feature sizes down to a few micrometers or even smaller ...